W200-SEMI

Wet bench with ultrasonic cleaning for semiconductor wafer processing

Unitevh Shyre’s W200 automated wet bench ultrasonic cleaning system was developed specifically for the semiconductor industry. The W200 is a wet bench tool designed to meet the stringent requirements of the semiconductor manufacturing processes; the system provides a reliable and cost-effective solution for cleaning and preparation of wafers and other sensitive components during production.

FPI

Automatic FPI machines with ultrasonic cleaning for orthopedic medical devices and aerospace

Unitech Shyre is a leader in automatic FPI machines. FPI (Fluorescent Penetrant Inspection) is a non-destructive inspection method that is used to detect surface defects in metallic and non-metallic parts. The process is used extensively for quality control of critical castings in industries such as orthopedic medical devices and aerospace components. The process involves ultrasonic […]

PC200 – Aqueous Cleaning System

Automated solutions with precision results, the PC200 provides a range of production options and adaptive for a number of configurations on request. Application: Precision Clean​ Configuration​ Processing prior to AR coating, precision/delicate optical cleaning​.