W200-SEMI
Unitech Shyre’s W200 automated wet bench ultrasonic cleaning system was developed specifically for the semiconductor industry. The W200 is a wet bench tool designed to
Unitech Shyre builds semiconductor wet benches for wafer, tooling and component cleaning, a specialist niche within our precision cleaning range. The W200-SEMI automated wet bench provides ultrasonic and aqueous cleaning with a choice of frequencies and aqueous, solvent or hybrid chemical processes, ionised air showers and air knives, and IR, hot air, vacuum or solvent drying, integrated with SECS-GEM communication and full batch tracking and datalogging. Our tools are certified to SEMI standards, with clean room integration and custom tooling designed for the specific process step.
From a standalone wet bench to a fully automated semiconductor wafer cleaning system, the team brings more than 30 years’ precision cleaning engineering experience to semiconductor applications. Contact our engineers to discuss your wafer or component cleaning process.
With our advanced technology and expertise, we ensure cleaning to the highest standards.
Unitech Shyre’s W200 automated wet bench ultrasonic cleaning system was developed specifically for the semiconductor industry. The W200 is a wet bench tool designed to
Automated solutions with precision results, the PC200 provides a range of production options and adaptive for a number of configurations on request. Application: Precision Clean
A stainless steel ultrasonic strip bath with integral rinse, the SU200 handles tool cleaning and lens stripping and accepts HCS200 and Umbra200 lens carriers directly.
Tell us about your parts, contaminant and throughput and an engineer will come back to you.
We use cookies to measure and improve this site. Privacy Policy.
